Application Note : The Living Database at Semicon Europe 2005
Summary
New integrated data management and model development tool for DRIE manufacturing
Keywords: cleanroom database control software , DRIE , Semicon Europe
Abstract
During the last decades Deep Reactive Ion Etching (DRIE) has become a technology widely used for the manufacturing of Micro System Technology (MST) devices, not only for the etching of silicon but also for the etching of thick oxides and glass. In standard IC processes where RIE is applied (sub)optimal operation point can be fixed during all fabrication cycles. For the application in MST devices, unfortunately, the structure to be etched is always different. There is no standardized DRIE process so far which implies equipment adaptation and process development for each device. In order to improve the applicability of DRIE for manufacturing purposes applied to MST, Adixen has developed the AMS I speeder line for silicon as well as glass etching. In collaboration with LioniX specific processes are being developed for the etching of glass resulting in increased etch speeds and proper dimensional control. In order to enable the users of the DRIE equipment to find a proper process for a desired structure, a model is being developed by PhoeniX in collaboration with Adixen and LioniX. The model generates not only the equipment settings but also suggests mask material and structuring of this layer. The multi disciplined, integrated knowledge, as being provided within this consortium, provides a firm basis for a broadly applicable DRIE model.
The presentation of The Living Database at Semicon Europe 2005 can be downloaded here (pdf file, 1.1 Mb).
Other topics
| Oct 20, 2008 | Integrated SOIMUMPs design by using MaskEngineer and FlowDesigner |
| Nov 20, 2007 | Process development using Design of Experiment |
| Jan 9, 2007 | Root finding using scripts |
| Sep 19, 2006 | Design of Experiment (DOE) + Monte-Carlo (MC) |
| Jul 19, 2006 | AWG design using OptoDesigner |
| Jul 1, 2006 | Network based layout, an application note |
| Jun 1, 2006 | GDS compiler for curve discretisation |
| May 31, 2005 | The Living Database at Nanotech 2005 |
| May 31, 2005 | The Living Database at Semicon Europe 2005 |
| Apr 5, 2005 | Integrating PhoeniX FlowDesigner into the Business Model |
| Feb 18, 2004 | Statistical Process Control (SPC) with Operator DB |
| Dec 12, 2003 | Cleanroom data management simplified |
| Sep 10, 2003 | Trends in Micro and Nano software |
| Sep 1, 2003 | PhoeniX Cleanroom Database: Process Flow module |
