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Integrating Process Flow Designer Software into the Business Model
Summary
PhoeniX FlowDesigner for Designer and Process Engineer.
Keywords: cost optimization
, process engineer
, process flow designer
What is PhoeniX MEMS processing steps at key locations gives designers a far better understanding of their final device - before committing to prototyping." >FlowDesigner :
PhoeniX MEMS processing steps at key locations gives designers a far better understanding of their final device - before committing to prototyping." >FlowDesigner is a very powerful piece of software that bridges the gap between the Design
Engineer and the Process Engineer. In its simplest usage the software is a technical/parametric process
flow drawing package. The users can store information within a process flow in text and graphics,
which allow immediate updates to the flow (without the need to spend hours modifying the whole
process). It documents accurately all the fabrication steps within the process allowing a 1st Order
Process Flow to be available for the Process Engineer. It allows the Process Engineer to
document his/her process steps in the database thus simplifying the design input to the flow.
It is a geometric process simulation. When the process engineer is fully involved, the software
can be used to check for process interactions and can be used as a simple way to check that
the process parameters are all compatible.
The Design Engineer and PhoeniX MEMS processing steps at key locations gives designers a far better understanding of their final device - before committing to prototyping." >FlowDesigner :
Allows design based on process variables and mathematical approximation models. Gives a
1st order process flow with complete documentation. Each process step is drawn and therefore
can be chosen to be used within the process flow documentation. Simple modification to the flow can
be made (a huge saving in time). All data and resulted process images are dimensionally accurate.
The data can be stored, modified, and updated at the touch of a key. The Material Database and
Etchant Response Database can be extended by the designer based on information from the
process engineer. Sections of structures from photomasks files can be used as input. Etching
can be checked. All standard processes are accepted. Allows ideas to be tried in software before
implementing the process in production %96 saving time and money.
Example File :
taken from
PhoeniX BV/FlowDesigner/ExampleFiles/oxidation.spt
Summary :
MEMS processing steps at key locations gives designers a far better understanding of their final device - before committing to prototyping." >FlowDesigner is equipped with general process models of directional and isotropic etching and
deposition. These general models can be used to build custom models, such as the one for oxidation
of silicon.
This example shows the profile of the wet and dry oxidation process on silicon. The profile is
created based on an empirical model called the Deal-Grove Model of Oxidation.
The Deal-Grove Model of Oxidation is an approximation model to predict oxide thickness prior to
growth. This model does not include advanced topics, such as bird's beak forming during a LOCOS
process. However this model is a good start for modeling the standard oxidation
process. More details concerning geometric simulation can be read at PhoeniX Flow Designer
Manual section 3.1
Reference :
http://tuttle.merc.iastate.edu/ee432/notes/oxidation/siliconoxidation.pdf
HTML Report (use Java applets):
Deal-Grove Model of Oxidation
The Process Engineer and MEMS processing steps at key locations gives designers a far better understanding of their final device - before committing to prototyping." >FlowDesigner :
Creates a 1st Order Process Flow with full graphical documentation. Make use of process information
directly as input by the Process Engineer. Simple etch process evaluation can show the impact of layer
thickness and feature proximity. It does not negate the need to do full 3-D process modeling however it
will pinpoint the locations where this modeling may be necessary. It stores the process flow in a form
that can be archived and/or modified at a later date. Allows simple process mistakes to be made in the
simplified model and therefore reduces product iteration. Allows process variations to be tried first in
software removing all the fundamental issues.
Example File :
taken from
PhoeniX BV/FlowDesigner/ExampleFiles/verification_example.spt
Summary :
One important activity in design is checking the tolerances. For example check the mask (alignment)
tolerances which are easily implemented in MEMS processing steps at key locations gives designers a far better understanding of their final device - before committing to prototyping." >FlowDesigner by using variables and for-loop statements.
This example deals with tolerance analysis for mask alignment. We introduce variable ''dx4'' which
define the size of the fourth opening of mask4 .
The mask4 is used to etch the metal (pink). Over-etched happens when the mask4's openings
are too big. Illustration 2 below shows the hole in the final profile because of over-etched on metal.
Illustration 3 below shows the correct profile when the openings' size of mask4 are sufficient.
HTML Report (use Java applets):
verification example for mask alignment
Download this article in pdf format
For any remark/question, please contact: support@phoenixbv.comOther topics
| Oct 22, 2009 | Installation of PhoeniX software on CentOS 5.3 linux |
| Sep 15, 2009 | Mirror several layers in CleWin |
| Sep 4, 2009 | Where to install PhoeniX Software in linux |
| Aug 31, 2009 | CleWin 3 with Windows Vista |
| May 8, 2009 | CleWin Default Grid |
| May 6, 2009 | Problems with installation or licenses (license type: node locked) |
| May 6, 2009 | Problems with installation or licenses (license type: floating license) |
| May 1, 2009 | Do you have process documentation software? |
| Mar 11, 2009 | Aspic does not run on some Windows versions |
| Nov 21, 2008 | Floating license server: no licenses available |
| Aug 22, 2008 | Living Database ReservationManager right click doesn't work |
| May 20, 2008 | CleWin 4 PRO : List of improvements and features |
| May 6, 2008 | Mysql connection failed |
| Apr 8, 2008 | CleWin 4 PRO: cannot find the tab for MatLab in the clewin's script editor. |
| Apr 3, 2008 | I want to improve yield, can your software help? |
| Feb 28, 2008 | Living Database Reservation Manager: Java Applet error message |
| Jan 18, 2008 | Aspic floating license |
| Jan 8, 2008 | Update license in keylock with Windows 2003 |
| Nov 19, 2007 | Ini-file settings not saved |
| Nov 6, 2007 | Set Grid size for GDS |
| Nov 6, 2007 | Import GDS and CIF into MaskEngineer |
| Nov 6, 2007 | Maximum layer number in MaskEngineer |
| Sep 25, 2007 | Is the Living Database able to communicate directly with our equipment? |
| Sep 7, 2007 | Can we connect our own information systems to your Living Database? |
| Sep 7, 2007 | How is SPC implemented in your tools? |
| Oct 24, 2006 | Keylock error message with the portable |
| Sep 13, 2006 | Subtract function gives unexpected results |
| Jun 13, 2006 | Using static variables |
| Jun 12, 2006 | A small start-up with limited cash reserves, do we need your control software? |
| Jun 12, 2006 | We run a University cleanroom facility and we have no need for fabrication control software. |
| Jun 12, 2006 | Is 24 hour control with your Living Databse possible? |
| Jun 12, 2006 | We never use large batches of wafers, so your process control software seems to be overkill. |
| Jun 12, 2006 | Can a University afford the Cleanroom DataBase? |
| Jun 12, 2006 | Why is the Living Database required for the device development stage of a product? |
| Jun 9, 2006 | GDSII and CIF generation settings for MaskEngineer and OptoDesigner |
| Jun 2, 2006 | OptoDesigner versus other simulation tools |
| May 31, 2006 | 2D/3D drawing programs versus FlowDesigner |
| May 22, 2006 | Get the outputs angle of AWG |
| May 16, 2006 | Data read/write in script |
| May 10, 2006 | Using array return values |
| Mar 6, 2006 | Install PhoeniX Floating License Server (Windows) |
| Nov 1, 2005 | What libraries do you use for the GUI? |
| Jul 1, 2005 | Mask Layout CleWin and Gerber : circles |
| Jun 1, 2005 | Parameteric design software generations |
| May 27, 2005 | Mask layout CleWin 3: snap to orthogonal |
| May 27, 2005 | Mask layout CleWin 3 : convert circles into polygon |
| Apr 20, 2005 | Mask Layout Software: Mask Layout Connectivity |
| Apr 19, 2005 | Mask Layout Software: Recursive Mask Design |
| Apr 11, 2005 | Beam Propagation Methods (BPM) in optical simulation software |
| Apr 10, 2005 | Is Flow Designer Software applicable for teaching. |
| Apr 10, 2005 | Do process engineers need your cleanroom database? |
| Apr 10, 2005 | Accurate Mask Grid Definition for high index contrast Si Waveguides |
| Apr 10, 2005 | Why do I need more than 1 nm mask discretisation? |
| Apr 10, 2005 | What is the benefit of a 10 nm or finer mask discretisation? |
| Apr 7, 2005 | FieldDesigner vs OlympIOs Optical Mode Solver |
| Apr 7, 2005 | FlowDesigner outputs to HTML for process flow documentation and report |
| Apr 7, 2005 | Process Flow Simulation: PhoeniX FlowDesigner |
| Apr 5, 2005 | Electro-Optics module in optical mode simulation software |
| Apr 5, 2005 | Thermo-Optics module in optical mode simulation software |
| Apr 5, 2005 | How to remove the rulers at CleWin? |
| Apr 5, 2005 | Error message : Could not access network location |
| Apr 2, 2005 | Numerical methods used in optical mode field simulation |
| Apr 1, 2005 | Numerical libraries used by PhoeniX Optical Simulation Software |
| Mar 18, 2005 | Incompatibilities between CleWin 3 and CleWin 2 |
| Mar 16, 2005 | Strech polygon or symbols in X axis or in Y axis only |
| Feb 15, 2005 | Architecture of the layout kernel |
| Feb 1, 2005 | MaskEngineer vs OlympIOs for parametric mask layout software |
| Jan 26, 2005 | Monitoring available licenses in PhoeniX server |
| Dec 29, 2004 | Integrating Process Flow Designer Software into the Business Model |
| Dec 10, 2004 | Install PhoeniX Floating License Server (pxkeysrv.exe) via command windows |
| Dec 3, 2004 | Mask layout on Linux using CleWin3 |
| Dec 3, 2004 | "Hidden text" in CleWin |
| Oct 4, 2004 | Installation of license server on Debian/Etch linux |
| Oct 4, 2004 | Flow Designer : Etch simulation gets very slow, what to do? |
| Sep 24, 2004 | Mask Layout Library in Mask Engineer |
| Sep 24, 2004 | Display The Port's Direction |
| Sep 24, 2004 | Making Mask Layout in Mask Engineer : Gear-Wheel |
| Sep 22, 2004 | Specify Cross Section (Layer) Functionality for Mask Layout in Mask Engineer |
| Sep 21, 2004 | Create User-Defined in Mask Layout Design Software |
| Sep 21, 2004 | Mask Engineer Built-In Curve (Polynom) to Interconnect Mask Layouts |
| Sep 20, 2004 | Define Mask Layout Connectivity in Mask Engineer : set component's name and connection points (ports). |
| Sep 16, 2004 | Create User-Defined Ports to Connect Mask Layout in Mask Engineer |
| Aug 17, 2004 | Process visualization software |
| Aug 16, 2004 | Create smooth mask layout files for micro fluidic channels |
| Aug 16, 2004 | MaskEngineer provides a parameterized library for mechanical components |
| Aug 16, 2004 | Defining mask layout(s) for a DOE experiment. |
| Aug 16, 2004 | Exporting mask layers to CIF or GDSII with two different resolutions. |
| Aug 16, 2004 | Accurate GDSII or CIF representation of smooth shapes in mask layouts. |
| Aug 16, 2004 | Mask Layout Connectivity : use PositionDivider to create ports |
| Aug 16, 2004 | In my mask layout I want to use complex profiles for my micro fluidic channels? Can I do that? |
| Jul 27, 2004 | Mask Export and Import : CleWin 3 with DXF |
| Jun 30, 2004 | CleWin 3 options to fill mask polygons |
| Jun 30, 2004 | The list of last used mask files in CleWin 3 |
| Jun 25, 2004 | Mask Export and Import : CleWin 3 with Gerber |
| May 14, 2004 | Choosing network addresses for license server and client PC |
| May 14, 2004 | Occasionally the program cannot find the key. Message "Keylock error". |
| May 13, 2004 | Mask layout CleWin displays wires differently from other mask viewers. |
| May 13, 2004 | CleWin "Not Responding". |
| Mar 22, 2004 | Print the mask layout at CleWin3 |
| Mar 22, 2004 | Select parts of the mask layout in CleWin |
| Mar 22, 2004 | Mask layout CleWin 3: convert wires into polygons option |
| Mar 22, 2004 | Open CleWin automatically via its mask layout files (cif, gds) |
| Mar 22, 2004 | Mask layout CleWin 3 : export mask Layer option |
| Mar 22, 2004 | Mask Layout CleWin 3 : layer number vs layer name |
| Feb 19, 2004 | The application cannot run at the client's sites. |
| Feb 10, 2004 | Mask layout CleWin 3 : Resolution issue when importing circle from DXF |
| Jan 28, 2004 | Polygon and wire issues in CleWin mask layout |
| Jan 16, 2004 | Install PhoeniX Floating License Server manually |
| Jan 15, 2004 | Process development software |
| Jan 15, 2004 | Process documentation software |
| Jan 15, 2004 | Process modeling software |
| Jan 14, 2004 | Process control software |
| Jan 13, 2004 | Connecting simulation tools to the Database products |
| Jan 13, 2004 | Linux (license) server with Windows clients |
| Jan 13, 2004 | Installation of PhoeniX Floating License Server on RedHat Linux |
| Jan 13, 2004 | LAN Scope for PhoeniX Floating License |
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