CleWin 4

Most micro technologies require different types of patterning processes at some stage during design and production cycles, in the transition from wafers to actual products. There are several methods of patterning, the most common of which is the application of photomasks. Therefore, the definition of such masks is a key step during micro product development.

CleWin is a hierarchical layout editor, i.e. a typical layout consists of symbols (also called cells) which may be nested, and can be directly accessed using the hierarchical tree-view of the design. Editing a symbol in one place will change all other instances of the same symbol. The basic drawing primitives are boxes, circles, wires and polygons. These are the basic shapes that can be stored in standard CIF format. Rings and spirals are automatically generated as wires. Text can be added as polygons. The latest version of CleWin not only has a built-in font, but also supports true-type fonts. CleWin uses a resolution of up to 1 nanometer, and features an unlimited undo function.

Complex polygons can be created using the boolean operations: merge, subtract, XOR and intersect. For example: to create a box with a circular hole in it, you just draw a box and a circle and select the subtract command. CleWin runs on a PC with Windows 95/98/NT/2000/XP. It is compatible with other layout packages because it uses the standard CIF and GDSII file formats. Furthermore, CleWin can read and write the AutoCAD DXF, Gerber RS-274X and Electromask EMK file formats. High r esolution PostScript is also available as an output format.

CleWin provides MaskSliceLink, a unique connection to FlowDesigner, the process visualization tool
If you are interested in the actual masks, PhoeniX can offer Order your masks at PhoeniX as well.

CleWin runs on a PC with Windows 95, 98, NT, 2000, XP, Vista or Windows 7.

For more information, please take a look at the PDF file.
For further information please contact us or use the information request form