CleWin 5 is the most powerful physical layout editor with an extensive feature set including hierarchy, true-type fonts and boolean operators in the market. Its innovative scripting engine and the high user-friendliness simplifies repetitive drawings
Most micro/nano technologies require different types of patterning processes at certain stages during design and production cycles. There are various methods of patterning, of which the application of photo masks is the most common one. Therefore, the definition of such masks is a critical step during micro product development. The reliable solution is CleWin 5.
CleWin 5 is a hierarchical layout editor. Typical layouts consists of symbols (also known as cells) which may be nested, and can be directly accessed by using the hierarchical tree-view of the design. Editing a symbol in one location will change several other instances of the same symbol. The basic drawing primitives are boxes, circles, wires and polygons, which can be stored in standard CIF format. Rings and spirals are automatically generated as wires. Options of including text elements can be realised as polygons. The newest version of CleWin now not only has a built-in font, but also supports true-type fonts. CleWin 5 uses a resolution of up to 1 picometer, and features an unlimited undo function.
Complex polygons can be created using the boolean operations: merge, subtract, XOR and intersect. For example: to create a box with a circular hole in it, you just draw a box and a circle and select the subtract command.
CleWin 5 uses the standard CIF and GDSII file format and runs on a PC with MS Windows XP, Vista or Windows 7.
CleWin 5 can now be purchased in different bundle options including
The combination of CleWin 5 and FlowDesigner delivers cross-sectional process flows (e.g. etching, deposition) to users. These can be exported as an animation, a html report or successive pictures per step.
MaskEngineer is PhoeniX Software's professional third generation object oriented and parametric mask layout package with a comprehensive feature set. MaskEngineer's domain specific scripting language is key when intending to create smooth curves or variations of patterns. CleWin 5 can now be extended with these above named advanced scripting functionalities. Furthermore, dedicated libraries of parametric layout elements for microfluidics, integrated optics and MEMS are available.
Read more about the improvements compared to CleWin4, go to CleWin 5 available now!
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