Multi Project Wafer (MPW) runs are used to share costs of fabricating the masks and the wafers for a variety of designs from different users. This is lowering the access barriers to apply micro and nano technologies in research and new product development.
Especially in the photonics domain, various options exist today for participating in a Multi Project Wafer run.
Organisations like ePIXfab, JePPIX, and LioniX offer different technology platforms to the community.
Depending on the actual application requirements, the most suitable platform that will meet the required specifications has to be selected.
Please contact the individual organisations for more details or get in touch with one of our application engineers at firstname.lastname@example.org.
|Europractice||SOI||Leti||passives with heater||15 March|
|Europractice||SOI||Leti||passives with heater||18 October|
|IHP||SOI||IHP||SG25 PIC||30 May|
|JePPIX||InP||SMARTPhotonics||10G Rx/Tx InP platform||15 Februari|
|JePPIX||InP||SMARTPhotonics||10G Rx/Tx InP platform||15 May|
|JePPIX||InP||SMARTPhotonics||10G Rx/Tx InP platform||15 August|
|JePPIX||InP||SMARTPhotonics||10G Rx/Tx InP platform||1 December|
|JePPIX||InP||FhG/HHI||InP Tx-Rx||15 April|
|JePPIX||InP||FhG/HHI||InP Tx-Rx||15 October|
|JePPIX||InP||Oclaro||Rx/Tx InP platform||to be announced later|
|LioniX||TriPleX||LioniX||High-contrast||April (training)||July (tape out)|
|LioniX||TriPleX||LioniX||High-contrast||September (training)||December (tape out)|
Regular training sessions are organised by the brokering organisations for participating foundries like CEA-Leti (F), imec (B), IHP (D), IME (Singapore), FhG/HHI (D), Oclaro (UK), SMARTPhotonics (NL) and LioniX (NL).
PhoeniX Software participates in most of these trainings to introduce its design environment and foundry specific Design Kits for the various technologies. Please check the training schedule or ask us for more information at email@example.com.
The schedule from previous runs can be found here.Back to overview.